Multiscale Instruments Develops Multi-Head AFM for Semiconductor Metrology
Multiscale Instruments is advancing semiconductor metrology with its innovative multi-head atomic force microscope (AFM), designed for real-time defect detection. This technology aims to improve production yield by integrating metrology into semiconductor manufacturing processes, a market with significant growth potential.
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Multiscale Instruments (MSI), led by CEO Je Won-ho, is developing a multi-head atomic force microscope (AFM) to enhance semiconductor metrology. The prototype features eight heads for simultaneous surface measurement, with plans to expand.
Currently, MSI is conducting tests with Samsung Electronics and discussing potential partnerships with SK Hynix and other manufacturers. The company is raising 4 to 5 billion Korean won in Series A funding and aims for customer Proof of Concept (PoC) validation in the latter half of this year, with mass production equipment expected in two years. MSI focuses on integrating metrology into process equipment, addressing the need for rapid, precise defect detection to support increasing semiconductor complexity.
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