Fujifilm Launches First Fluorine-Free Photoresist for AI Semiconductor Manufacturing

Fujifilm has introduced the world's first fluorine-free negative-tone ArF immersion photoresist, aimed at semiconductor manufacturers focused on artificial intelligence applications. The company has started distributing samples to clients and plans commercial sales after customer evaluations.

This new photoresist achieves vital functions traditionally reliant on fluorine-containing materials, thereby addressing both environmental compliance and manufacturing efficiency. By eliminating fluorine, semiconductor fabs can reduce energy-intensive waste management processes associated with fluorine-containing liquids.

Fujifilm's previous achievements in the sector include developing a PFAS-free nanoimprint resist and a fluorine-free variant of a negative-tone resist. The advancement in photoresist technology is critical as the semiconductor industry faces escalating demand for advanced nodes, impacting fabrication processes and waste management.