Centrotherm Launches c.Plasma Q Max PECVD Tool for High-Volume TOPCon Solar Cell Production
Centrotherm has introduced the c.Plasma Q Max, a PECVD tool designed for high-volume TOPCon solar cell manufacturing, processing up to 10,000 wafers per hour. The system supports various layer depositions, including tunnel oxide and doped polysilicon, without requiring changes to quartz components. It is compatible with M10, M12, G12R, and half cell wafer sizes.
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Centrotherm has launched the c.Plasma Q Max, a new PECVD tool for high-volume TOPCon solar cell manufacturing, capable of processing up to 10,000 wafers per hour. The system features a single process chamber for three graphite boats in one run, enabling the formation of ultra-thin tunnel oxide and doped polysilicon layers with a deposition rate of 20 nm/min.
It supports the deposition of typical TOPCon layers such as SiNx and SiOx, as well as front side AR coatings. The aluminum process chamber eliminates the need for quartz tube changes. The tool is compatible with M10, M12, G12R, and half cell wafer sizes. As of 2025, Centrotherm operates 50 turnkey lines and 4,300 thermal process systems.
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